Same Dress, Two Designers? When Imitation is Piracy, Not Flattery – Protecting Intellectual Property in the Fashion Industry

Coming up on September 8, 2011, at 6:00 PM, coinciding with the September 2011 New York City Fashion Week, the Cyberspace Law Committee of New York County Lawyers Association is putting on a Continuing Legal Education course on Intellectual Property protections in the fashion industry.

This course is for both lawyers and non-lawyers (no CLE credit for non-lawyers).

Full Disclosure: I am announcing this event because, in late 2010, I was appointed co-chair of New York County Lawyers’ Associations Cyberspace Law Committee and this is one of our projects.

Course Description:

Celebrate New York Fashion Week by joining us at a special program focusing on protecting intellectual property rights in the fashion industry. While imitation can be considered the highest form of flattery, it can also be costly, harmful to businesses – and even illegal.

Learn the ins and outs of legal protection in the fashion industry, including how Trademark, Copyright and Design-Patent laws  can be, and are used, in the United States and in Europe against copying and counterfeiting in the fashion industry.

Special focus will also be given  to new legislation, the “Innovative Design Protection and Piracy Prevention Act” (IDPPA), now pending in Congress.

Faculty:
Program Co-sponsor: NYCLE Cyberspace Committee, Allan Pearlman and Natalie Sulimani, Co-Chairs   

Program Chair:Viviana Mura,  Herzfeld & Rubin P.C.

Faculty: Prof. Guillermo C. Jimenez, Fashion Institute of Technology and co-author, “Fashion Law, A Guide for Designers, Fashion Executives, and Attorneys”; Viviana Mura,  Herzfeld & Rubin P.C.; Joseph Francis Murphy, Law Office of Joseph Francis Murphy, Esq.

For more information go to www.nycla.org or to the specific page for the Same Dress, Two Designers? by clicking here.